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SPIE Proceedings [SPIE Microelectronic and MEMS Technologies - Edinburgh, United Kingdom (Wednesday 30 May 2001)] Process and Equipment Control in Microelectronic Manufacturing II - Characterization of ultrathin gate dielectrics using combined grazing x-ray reflectance and spectroscopic ellipsometry
Boher, Pierre, Piel, Jean-Philippe, Evard, Patrick, Defranoux, Christophe, Stehle, Jean-Louis P., Fallon, MartinVolume:
4405
Year:
2001
Language:
english
DOI:
10.1117/12.425256
File:
PDF, 700 KB
english, 2001