SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Reduction of mask error enhancement factor (MEEF) by the optimum exposure dose self-adjusted mask
Matsuura, Seiji, Uchiyama, Takayuki, Hashimoto, Takeo, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435783
File:
PDF, 95 KB
english, 2001