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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - CD control analysis of the SCALPEL-HT/alpha optics
Stanton, Stuart T., Waskiewicz, Warren K., Munro, Eric, Rouse, John A., Zhu, Xieqing, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436643
File:
PDF, 622 KB
english, 2001