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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - High-resolution and high-stability electromagnetic-deflection control system for EB lithography system
Nagata, Koji, Okumura, Masahide, Maio, Kenji, Fujii, Akira, Andoh, Hisashi, Morimura, Toshiyuki, Hayakawa, Hajime, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436692
File:
PDF, 179 KB
english, 2001