SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Compact Z-pinch EUV source for photolithography
Schriever, Guido, Rahe, Manfred, Stamm, Uwe, Basting, Dirk, Khristoforov, Oleg B., Vinokhodov, Aleksandr Y., Borisov, Vladimir M., Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436716
File:
PDF, 176 KB
english, 2001