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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Chemical mechanical planarization process induced within lot overlay variation in 0.20-μm DRAM: solution and simulation model
Chen, Chih-Ping, Huang, Brian, Lee, Wilson, Chung, Wen-Jye, Hou, Holden T., Sullivan, Neal T.Volume:
4344
Year:
2001
Language:
english
DOI:
10.1117/12.436731
File:
PDF, 483 KB
english, 2001