SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Characterization of new aromatic polymers for 157-nm photoresist applications
Fender, Nicolette, Brock, Phillip J., Chau, W., Bangsaruntip, S., Mahorowala, Arpan P., Wallraff, Gregory M., Hinsberg, William D., Larson, Carl E., Ito, Hiroshi, Breyta, Gregory, Burnham, Kikue, TruoVolume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436873
File:
PDF, 1023 KB
english, 2001