SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - 157-nm imaging using thick single-layer resists
Crawford, Michael K., Feiring, Andrew E., Feldman, Jerald, French, Roger H., Petrov, Viacheslav A., Schadt III, Frank L., Smalley, Robert J., Zumsteg, Jr., Fredrick C., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436874
File:
PDF, 532 KB
english, 2001