SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Advanced KrF chemical amplified photoresists for 0.13-μm lithography
Lin, Qunying, Sack, Michael J., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436894
File:
PDF, 1.51 MB
english, 2001