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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Effect of end group structures of methacrylate polymers on ArF photoresist performances
Momose, Hikaru, Wakabayashi, Shigeo, Fujiwara, Tadayuki, Ichimura, Kiyoshi, Nakauchi, Jun, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436903
File:
PDF, 213 KB
english, 2001