SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Contact holes: optical area measurement predicts printability and is highly repeatable
Scheid, Glen W., Taylor, Darren, Fiekowsky, Peter, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438330
File:
PDF, 152 KB
english, 2001