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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Performance of improved e-beam lithography system JBX-9000MVII
Komagata, Tadashi, Nakagawa, Yasutoshi, Gotoh, Nobuo, Tanaka, Kazumitsu, Kawahira, HiroichiVolume:
4409
Year:
2001
Language:
english
DOI:
10.1117/12.438404
File:
PDF, 1.15 MB
english, 2001