SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Advanced CD Linearity Improvement for Multi-Project Wafers and SoC at 95 nm Technology Node
Lu, Jeremy, Sandlin, Nicole L., Sato, Hidetoshi, Lu, Colbert, Cheng, Nicole, Huang, Torey, Su, Clyde, Buie, Melisa J., Grenon, Brian J., Kimmel, Kurt R.Volume:
4889
Year:
2002
Language:
english
DOI:
10.1117/12.467750
File:
PDF, 66 KB
english, 2002