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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Fabrication of a fly-eye mirror for an extreme-ultraviolet lithography illumination system by arranging silicon mirror elements
Takino, Hideo, Kobayashi, Teruki, Nomura, Kazushi, Kuki, Masaaki, Itoh, Akinori, Nakamura, Junji, Komatsuda, Hideki, Shibata, Norio, Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472340
File:
PDF, 783 KB
english, 2002