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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Simulation model of in-plane distortion in EUVL mask during chucking
Chiba, Akira, Ota, Kazuya, Hoshino, Eiichi, Sugawara, Minoru, Ogawa, Taro, Okazaki, Shinji, Engelstad, Roxann L.Volume:
4688
Year:
2002
Language:
english
DOI:
10.1117/12.472348
File:
PDF, 410 KB
english, 2002