SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing - Optimization of an x-ray mask design for use with horizontal and vertical kinematic mounts
Laird, Daniel L., Engelstad, Roxann L., Palmer, Shane R., Peckerar, Martin C.Volume:
1465
Year:
1991
Language:
english
DOI:
10.1117/12.47351
File:
PDF, 649 KB
english, 1991