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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - New approach for 193-nm resist using modified cycloolefin resin
Park, Joo Hyeon, Seo, Dong-Chul, Kim, Chang-Min, Lim, Young T., Jo, Seong D., Lee, Jong-Bum, Joo, Hyeon S., Jeon, Hyun P., Kim, Seong-Ju, Jung, Jae Chang, Shin, Ki-Soo, Kong, Keun-Kyu, Yamada, TatsuyaVolume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474209
File:
PDF, 430 KB
english, 2002