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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - 157-nm single-layer resists based on advanced fluorinated polymers
Shida, Naomi, Watanabe, Hiroyuki, Yamazaki, Tamio, Ishikawa, Seiichi, Toriumi, Minoru, Itani, Toshiro, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474247
File:
PDF, 573 KB
english, 2002