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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Stable E-beam metrology on ArF resist for advanced process control
Ke, Chih-Ming, Yen, Anthony, Yee, Jason C., Chu, Mico, Fu, Steven, Huang, Eros, Yeh, Debbie, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474260
File:
PDF, 130 KB
english, 2002