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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Simulation and characterization of silicon oxynitrofluoride films as a phase-shift mask material for 157-nm optical lithography
Kim, SungKwan, Choi, Eunchul, Kim, Hyoungdo, Kim, Jungmin, No, Kwangsoo, Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474558
File:
PDF, 103 KB
english, 2002