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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Aerial image degradation effects due to imperfect sidewall profiles of EAPSM mask for 130-nm device node: 3D EMF simulations and wafer printing results
Kim, Won D., Rathsack, Benjamen M., Yen, AnthonyVolume:
4691
Year:
2002
Language:
english
DOI:
10.1117/12.474576
File:
PDF, 775 KB
english, 2002