SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Calibration and validation of projection lithography in chemically amplified resist systems using fluorescence imaging
Mason, Michael D., Ray, Krishanu, Feke, Gilbert D., Grober, Robert D., Pohlers, Gerd, Cameron, James F., Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.483753
File:
PDF, 943 KB
english, 2003