SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Improvement of pattern collapse issue by additive-added D.I. water rinse process
Tanaka, Keiichi, Naito, Ryoichiro, Kitada, Tomohiro, Kiba, Yukio, Yamada, Yoshiaki, Kobayashi, Masakazu, Ichikawa, Hiroyuki, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485069
File:
PDF, 629 KB
english, 2003