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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Optical Microlithography XVI - Layer-specific illumination optimization by Monte Carlo method
Kim, Ho-Chul, Nam, Dong-Seok, Hwang, Chan, Kang, Young S., Woo, Sang-Gyun, Cho, Han-Ku, Han, Woo-Sung, Yen, AnthonyVolume:
5040
Year:
2003
Language:
english
DOI:
10.1117/12.485383
File:
PDF, 417 KB
english, 2003