SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Real-time optical CD metrology for litho process
Opsal, Jon L., Wen, Youxian, Lee, Joungchel, Smith, Walter L., Herr, Daniel J.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.487605
File:
PDF, 431 KB
english, 2003