SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Overcoat materials for acrylate resists to enhance their resolution
Nozaki, Koji, Igarashi, Miwa, Yano, Ei, Yamamoto, Hajime, Takechi, Satoshi, Hanyu, Isamu, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.487727
File:
PDF, 839 KB
english, 2003