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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Proximity effects for rinse, dry, and etch parameters
Kim, Sang-Kon, Tanabe, Hiroyoshi, Oh, Hye-Keun, Kim, Ho SeobVolume:
5130
Year:
2003
Language:
english
DOI:
10.1117/12.504192
File:
PDF, 130 KB
english, 2003