![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Near-0.3 k 1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
Van Den Broeke, Douglas J., Kimmel, Kurt R., Staud, Wolfgang, Socha, Robert, Hsu, Stephen D., Chen, J. Fung, Laidig, Thomas L., Corcoran, Noel, Hollerbach, Uwe, Wampler, Kurt E., Shi, XuelongVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.518308
File:
PDF, 1011 KB
english, 2003