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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Sub-80-nm contact hole patterning using Step and Flash Imprint Lithography
Mancini, David P., Mackay, R. Scott, Le, Ngoc, Gehoski, Kathleen A., Young, Steven, Dauksher, William J., Nordquist, Kevin J., Resnick, Douglas J.Volume:
5374
Year:
2004
Language:
english
DOI:
10.1117/12.537382
File:
PDF, 1.00 MB
english, 2004