SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Contact hole application for lithography process development using the Opti-Probe three-dimensional RT/CD technology
Jiang, Zhiming, Silver, Richard M., Sorkhabi, Osman, Chu, Hanyou, Cao, XueLong, Li, Guangwei, Wen, Youxian, Opsal, Jon L., Chang, Yia-ChungVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.556587
File:
PDF, 590 KB
english, 2004