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SPIE Proceedings [SPIE 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Dresden, Germany (Monday 12 January 2004)] 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Implementation of a transparent etch stop layer for an improved alternating PSM
Cangemi, Michael J., Taylor, Darren, Lassiter, MatthewVolume:
5504
Year:
2004
Language:
english
DOI:
10.1117/12.568018
File:
PDF, 964 KB
english, 2004