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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - New solutions for inspection contrast tuning, enhanced chemical durability, and a new ultrahigh-transmission PSM
Becker, Hans W., Staud, Wolfgang, Weed, J. Tracy, Schley, Pascal, Schmidt, Frank, Sobel, Frank, Renno, Markus, Olschewski, Nathalie, Seitz, Holger, Buttgereit, Ute, Knapp, Konrad, Hess, GuenterVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.570217
File:
PDF, 260 KB
english, 2004