SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - Photomask development for 90-nm technology
Zhang, Yuan, Wang, Yangyuan, Yao, Jun-en, Cottle, Rand, Mackay, Scott, Progler, Christopher J., Xiao, Guangming, Unruh, James, Progler, Christopher J.Volume:
5645
Year:
2004
Language:
english
DOI:
10.1117/12.570482
File:
PDF, 141 KB
english, 2004