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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Data Analysis and Modeling for Process Control II - Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system
Lin, Wen-Kuang, Emami, Iraj, Liao, Shih-Hsien, Tsai, Ronghao, Yeh, Mike, Hsieh, Calvino, Yu, Y., Lin, Benjamin Szu-Min, Fu, Steven, Dziura, Thaddeus G.Volume:
5755
Year:
2005
Language:
english
DOI:
10.1117/12.598983
File:
PDF, 96 KB
english, 2005