SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - A super-precision evaluation method of ultra-low expansion glasses using the line-focus-beam ultrasonic material characterization system
Kushibiki, Jun-ichi, Silver, Richard M., Arakawa, Mototaka, Ohashi, Yuji, Suzuki, Kouji, Maruyama, TakahisaVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.599160
File:
PDF, 468 KB
english, 2005