SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Exploring the 65nm frontier of alternating phase shifting masks with a quartz dry etch chemistry
Anderson, S. A., Smith, Bruce W., Neubauer, R., Kumar, A., Ibrahim, I.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.599984
File:
PDF, 190 KB
english, 2005