SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Optical lithography technologies for 45-nm node CMOS
Mimotogi, Shoji, Smith, Bruce W., Uesawa, Fumikatsu, Kyoh, Suigen, Fujise, Hiroharu, Shiobara, Eishi, Katsumata, Mikio, Hane, Hiroki, Sugiyama, Tomohiro, Sho, Koutaro, Miyazaki, Maki, Takahata, KazuhiVolume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.600948
File:
PDF, 496 KB
english, 2005