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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - A study of Cr to Mosi in-situ dry etching process to reduce plasma induced defect
Jang, Il-Yong, Weed, J. Tracy, Martin, Patrick M., Park, Young-Ju, Kwon, Hyuk-Joo, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-SungVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.631951
File:
PDF, 163 KB
english, 2005