SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Performance of the ALTA 4700 with variable print strategy and optimized resist process
Allen, Paul C., Weed, J. Tracy, Martin, Patrick M., Hamaker, H. Christopher, Morgante, Cris, Berwick, Andrew, White, MichaelVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.633049
File:
PDF, 489 KB
english, 2005