SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Acoustic streaming effects in megasonic cleaning of EUV photomasks: a continuum model
Kapila, Vivek, Weed, J. Tracy, Martin, Patrick M., Deymier, Pierre A., Shende, Hrishikesh, Pandit, Viraj, Raghavan, Srini, Eschbach, Florence O.Volume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.633378
File:
PDF, 688 KB
english, 2005