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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Modeling OPC complexity for design for manufacturability
Gupta, Puneet, Weed, J. Tracy, Martin, Patrick M., Kahng, Andrew B., Muddu, Swamy, Nakagawa, Sam, Park, Chul-HongVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.633416
File:
PDF, 251 KB
english, 2005