SPIE Proceedings [SPIE 21st European Mask and Lithography Conference - Dresden, Germany (Thursday 16 June 2005)] 21st European Mask and Lithography Conference - Application results at 193nm: lithography emulation by aerial imaging and supplementary high resolution measurements
Zibold, Axel M., Schmid, Rainer, Bohm, Klaus, Brunner, Robert, Durr, Arndt C.Volume:
5835
Year:
2005
Language:
english
DOI:
10.1117/12.637309
File:
PDF, 370 KB
english, 2005