SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Bias-free measurement of LER/LWR with low damage by CD-SEM
Yamaguchi, Atsuko, Archie, Chas N., Steffen, Robert, Kawada, Hiroki, Iizumi, TakashiVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.655496
File:
PDF, 293 KB
english, 2006