![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - OPC and verification accuracy enhancement using the 2D wafer image for the low-k1 memory devices
Ban, Yong-Chan, Flagello, Donis G., Lee, Dong-Yoon, Hong, Ji-Suk, Yoo, Moon-Hyun, Kong, Jeong-TaekVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656280
File:
PDF, 545 KB
english, 2006