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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - The deprotection reaction front profile in model 193nm methacrylate-based chemically amplified photoresists
Vogt, Bryan D., Lin, Qinghuang, Kang, Shuhui, Prabhu, Vivek M., Rao, Ashwin, Lin, Eric K., Satija, Sushil K., Turnquest, Karen, Wu, Wen-liVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.656464
File:
PDF, 252 KB
english, 2006