SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Fundamental characterization of silicon-containing spin-on hardmask for 193nm photolithography
Sipani, Vishal, Lin, Qinghuang, Hishiro, Yoshi, Abatchev, MirzaferVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.659102
File:
PDF, 250 KB
english, 2006