SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Amplification of the index of refraction of aqueous immersion fluids with crown ethers: a progress report
López-Gejo, Juan, Lin, Qinghuang, Kunjappu, Joy T., Turro, Nicholas J., Conley, WillVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.659821
File:
PDF, 878 KB
english, 2006