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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Reducing process contributions to CD error range using the Sigma7500 pattern generator and ProcessEqualizer TM
Hellgren, Jonas, Hoga, Morihisa, Fosshaug, Hans, Österberg, Anders, Ivansen, LarsVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681743
File:
PDF, 563 KB
english, 2006