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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Higher current density operation with EB reticle writer EBM-5000
Saito, Masato, Hoga, Morihisa, Ugajin, Kunihiro, Higaki, Tomotaka, Nishino, Hideaki, Watanabe, HidehiroVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681747
File:
PDF, 296 KB
english, 2006