SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - CD and profile metrology of EUV masks using scatterometry based optical digital profilometry
Cho, Sung-yong, Martin, Patrick M., Naber, Robert J., Yedur, Sanjay, Kwon, Michael, Tabet, MiladVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.686478
File:
PDF, 511 KB
english, 2006